SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND MICRO PROCESSOR, PROCESSOR, SYSTEM, DATA STORAGE SYSTEM AND MEMORY SYSTEM INCLUDING THE SEMICONDUCTOR DEVICE

摘要

Provided are a semiconductor device and a manufacturing method thereof. According to an embodiment of the present invention, the semiconductor device includes a substrate including multiple line patterns extended in a second direction, and multiple column patterns vertically protruding from the line patterns and arranged in the second direction and a first direction crossing the second direction; a source line embedded between the line patterns to be extended in the second direction while being connected with line patterns placed in both sides of the source line; a word line extended in the first direction while touching a side wall of the column patterns arranged in the first direction; an interconnection line placed on the column patterns and extended in the first direction to be connected to the column patterns arranged in the first direction; a variable resistance element placed on the interconnection line and placed between adjacent column patterns in the first direction; and a bit line placed on the variable resistance element and extended in the second direction to be connected to the variable resistance element arranged in the second direction.