发明名称 Graphene devices and methods of fabricating the same
摘要 <p>A graphene device includes: a semiconductor substrate (110) having a first region (110A, 110B) and a second region (110C); a graphene layer (120) on the first region, but not on the second region of the semiconductor substrate; a first electrode (130) on a first portion of the graphene layer; a second electrode (140) on a second portion of the graphene layer; an insulating layer (160) between the graphene layer and the second electrode; and a third electrode (150) on the second region of the semiconductor substrate. The semiconductor substrate has a tunable Schottky barrier formed by junction of the graphene layer and the semiconductor substrate.</p>
申请公布号 EP2787533(A1) 申请公布日期 2014.10.08
申请号 EP20140150529 申请日期 2014.01.09
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 CHUNG, HYUN-JONG;SEO, DAVID;PARK, SEONG-JUN;BYUN, KYUNG-EUN;SONG, HYUN-JAE;YANG, HEE-JUN;HEO, JIN-SEONG
分类号 H01L29/778;H01L21/74;H01L29/08;H01L29/16;H01L29/165;H01L29/417;H01L29/78 主分类号 H01L29/778
代理机构 代理人
主权项
地址