发明名称 WAFER ADHERING APPARATUS
摘要 The present invention is to make a wafer in contact with the air in the UV curing process and the outer circumference of a liquid resin be in nitrogen atmosphere within a short period of time. A wafer adhering apparatus (1) of the present invention comprises: a stage (23) for maintaining a sheet (S); a resin supplying means (24) for supplying the liquid resin (5) onto the sheet; a pressing means (25) maintained to press a wafer (W) toward the sheet on the top of the stage; and a ultraviolet light irradiation means (28) for irradiating ultraviolet rays on the stage by passing through the stage. A plurality of nozzle openings (253) are formed to surround the wafer on the pressing means, and nitrogen is injected from the nozzle openings.
申请公布号 KR20140118749(A) 申请公布日期 2014.10.08
申请号 KR20140027669 申请日期 2014.03.10
申请人 DISCO CORPORATION 发明人 ONO TAKASHI;ONODERA HIROSHI;KUWANA KAZUTAKA
分类号 H01L21/301 主分类号 H01L21/301
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