发明名称 METHOD FOR OPERATING VACUUM PROCESSING APPARATUS
摘要 The present invention provides a method for operating a vacuum processing apparatus capable of increasing the throughput or the efficiency in processing samples, comprising a number determining step of, before any one of the plurality of wafers is carried out from the cassette, determining whether a number of the wafers being present and currently being transported on the transport path is equal to or less than a predetermined value; a remaining-time determining step of determining whether a total of a remaining processing time of the wafer being scheduled to be processed and being present in the one vacuum processing vessel and a processing time of the wafer being present and currently being transported on the transport path is equal to or less than a predetermined value; and a transport order skip step of, if a condition in the number determining step or in the remaining-time determining step is not satisfied, performing the number determining step and the remaining processing time determining step on the wafers after the any one wafer in accordance with the transport order, and newly specifying the wafer first satisfying the condition in these steps, as a wafer to be carried out from the cassette in place of an arbitrary wafer.
申请公布号 KR20140118668(A) 申请公布日期 2014.10.08
申请号 KR20130100212 申请日期 2013.08.23
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KAWAGUCHI MICHINORI;INOUE SATOMI;SUEMITSU YOSHIRO;NOGI KEITA
分类号 H01L21/677;H01L21/02 主分类号 H01L21/677
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