发明名称 ETCHANT COMPOSITION FOR COPPER-CONTAINING METAL LAYER AND PREPARING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING SAME
摘要 The present invention relates to an etching solution composition for a cooper-based metal film, and a method to manufacture an array substrate for a liquid crystal display device using the same. According to the present invention, the etching solution composition includes: a water-soluble compound having a nitrogen atom and a carboxyl group in one molecule, an azole compound, a compound containing fluoride, a sulfate compound, citric acid, and water. Therefore, the etching solution composition has significantly enhanced stability and can form a micropattern.
申请公布号 KR20140118318(A) 申请公布日期 2014.10.08
申请号 KR20130033957 申请日期 2013.03.28
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 KWON, O BYOUNG;KIM, DONG KI;CHOI, YONG SUK
分类号 C23F1/18;C09K13/06;G02F1/136;H01L21/306 主分类号 C23F1/18
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