MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY

摘要

The present invention relates to a method for manufacturing an array substrate for a liquid crystal display device, including the steps of: sequentially stacking a pure amorphous silicon (a-Si:H) thin film on a substrate and an amorphous silicon (n+a-Si:H) thin film having impurities thereon; forming a mask pattern having an open etching area on the amorphous silicon (n+a-Si:H) thin film having impurities; and etching only the amorphous silicon (n+a-Si:H) thin film having impurities on the pure amorphous silicon (a-Si:H) thin film using an etchant composition. The etchant composition comprises based on the total weight of the composition: (A) 5.0 to 15.0 wt% of persulfate; (B) 1.0 to 20.0 wt% of Fe^3+ compounds; (C) 0.01 to 10.0 wt% of fluorine compounds; and (D) the remainder water.