ETCHANT COMPOSITION, METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME

摘要

Disclosed is an etching composition that includes 25-35 wt% of phosphate, 3-9 wt% of nitric acid, 10-20 wt% of acetic acid, 5-10 wt% of nitrate, 6-15 wt% of a sulfonic acid compound, 1-5 wt% of an amine compound including a carboxyl group, 0.1-1 wt% of water soluble amino acids, 0.01-1 wt% of an azole-based compound, and the remainder consisting of water.