| 发明名称 | Coating method for gas delivery system | ||
| 摘要 | A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating. | ||
| 申请公布号 | US8852685(B2) | 申请公布日期 | 2014.10.07 |
| 申请号 | US201012766529 | 申请日期 | 2010.04.23 |
| 申请人 | Lam Research Corporation | 发明人 | Kenworthy Ian;Outka Duane;Hao Fangli;Sharpless Leonard;Du Yijun |
| 分类号 | C23F1/08;B05D7/22 | 主分类号 | C23F1/08 |
| 代理机构 | Buchanan Ingersoll & Rooney PC | 代理人 | Buchanan Ingersoll & Rooney PC |
| 主权项 | 1. A method for coating inner surfaces of gas passages of a gas delivery system configured to deliver process gases into a chamber of a plasma processing system wherein semiconductor substrates are processed, the method comprising: (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating; wherein the gas passages deliver process gases into the chamber of the plasma processing system; andthe fluidic precursor is a liquid. | ||
| 地址 | Fremont CA US | ||