发明名称 |
COMPOSITION FOR FORMING PASSIVATION FILM, SEMICONDUCTOR SUBSTRATE PROVIDED WITH PASSIVATION FILM AND METHOD FOR PRODUCING SAME, AND SOLAR CELL ELEMENT AND METHOD FOR PRODUCING SAME |
摘要 |
The invention provides a composition for forming a passivation film, including: an organic aluminum compound represented by General Formula (I); and a resin, wherein R1's each independently represent an alkyl group having 1 to 8 carbon atoms; n represents an integer of from 0 to 3; X2 and X3 each independently represent an oxygen atom or a methylene group; R2, R3 and R4 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. |
申请公布号 |
KR20140117399(A) |
申请公布日期 |
2014.10.07 |
申请号 |
KR20147019198 |
申请日期 |
2012.12.28 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
TANAKA TOORU;ORITA AKIHIRO;NOJIRI TAKESHI;YOSHIDA MASATO |
分类号 |
H01L31/04;H01L21/312;H01L21/316;H01L31/0256;H01L51/46 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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