发明名称 COMPOSITION FOR FORMING PASSIVATION FILM, SEMICONDUCTOR SUBSTRATE PROVIDED WITH PASSIVATION FILM AND METHOD FOR PRODUCING SAME, AND SOLAR CELL ELEMENT AND METHOD FOR PRODUCING SAME
摘要 The invention provides a composition for forming a passivation film, including: an organic aluminum compound represented by General Formula (I); and a resin, wherein R1's each independently represent an alkyl group having 1 to 8 carbon atoms; n represents an integer of from 0 to 3; X2 and X3 each independently represent an oxygen atom or a methylene group; R2, R3 and R4 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
申请公布号 KR20140117399(A) 申请公布日期 2014.10.07
申请号 KR20147019198 申请日期 2012.12.28
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 TANAKA TOORU;ORITA AKIHIRO;NOJIRI TAKESHI;YOSHIDA MASATO
分类号 H01L31/04;H01L21/312;H01L21/316;H01L31/0256;H01L51/46 主分类号 H01L31/04
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