发明名称 |
Method of photolithography using a fluid and a system thereof |
摘要 |
A photolithographic exposure system for use on a photoresist on a substrate includes an illumination system, a photomask with one or more object patterns, a projection optical exposure system, and a fluid dispensing system. The projection optical exposure system is positioned to project an image of the one or more object patterns toward an image plane. The fluid dispensing system positions a fluid between the projection optical exposure system and the photoresist on the substrate. The fluid has a refractive index value above a refractive index value of water and an absorbance below 0.8 per millimeter at wavelengths between about 180 nm and about 300 nm. |
申请公布号 |
US8852850(B2) |
申请公布日期 |
2014.10.07 |
申请号 |
US200511049796 |
申请日期 |
2005.02.03 |
申请人 |
Rochester Institute of Technology |
发明人 |
Smith Bruce W. |
分类号 |
G03F7/00;G03B27/42;G03F7/20 |
主分类号 |
G03F7/00 |
代理机构 |
Bond Schoeneck & King PLLC |
代理人 |
Noto Joseph M.;Bond Schoeneck & King PLLC |
主权项 |
1. A photolithographic exposure system for use on a photoresist on a substrate, the system comprising:
an illumination system which provides a source of radiation; a photomask with one or more object patterns; a projection optical exposure system positioned to project an image of the one or more object patterns towards an image plane on the photoresist using the radiation from the illumination system; and a liquid with additive dispensing system that positions a liquid with at least one inorganic additive at a concentration of at least about 16% between the projection optical exposure system and the photoresist on the substrate, the liquid with the at least one additive has a refractive index value above a refractive index value of water and an absorbance below 0.8 per millimeter at wavelengths below about 300 nm. |
地址 |
Rochester NY US |