发明名称 TRANSFER CHAMBER FOR VACUUM PROCESSING SYSTEM
摘要 <p>The present invention relates to a returning chamber of a vacuum treatment system which treats wafers, glass substrates for LCD panel within a vacuum. Especially, the returning chamber, according to the present invention, can endure higher vacuum by having at least some part of the lower part thereof in a curved shape equivalent to that of a side of a cylinder. Accordingly, the width of the lower part can be reduced to endure a certain level of vacuum, which leads to reduced manufacturing costs, and the transportation of the invention is easier due to the reduced weight.</p>
申请公布号 KR20140117321(A) 申请公布日期 2014.10.07
申请号 KR20140112874 申请日期 2014.08.28
申请人 WONIK IPS CO., LTD. 发明人 AHN, SUNG IL;KIM, JAE KUN
分类号 H01L21/677 主分类号 H01L21/677
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