发明名称 |
Phase-change random access memory device and method of manufacturing the same |
摘要 |
A phase-change random access memory (PCRAM) device includes a semiconductor substrate; switching elements formed on the semiconductor substrate; a plurality of phase-change structures formed on the switching elements; and heat absorption layers buried between the plurality of phase-change structures, wherein the plurality of phase-change structures are insulated from the heat absorption layers. |
申请公布号 |
US8853044(B2) |
申请公布日期 |
2014.10.07 |
申请号 |
US201314076770 |
申请日期 |
2013.11.11 |
申请人 |
SK Hynix Inc. |
发明人 |
Park Nam Kyun |
分类号 |
H01L21/20;H01L45/00;H01L27/24 |
主分类号 |
H01L21/20 |
代理机构 |
IP & T Group LLP |
代理人 |
IP & T Group LLP |
主权项 |
1. A method of manufacturing phase-change random access memory (PCRAM) device, comprising:
providing a semiconductor substrate; foaming switching elements on the semiconductor substrate; forming a plurality of phase-change structures on the switching elements; and forming heat absorption layers between the plurality of phase-change structures, wherein the forming each of the plurality of phase-change structures includes:
forming a heater material on each of the switching elements;forming a phase-change material on the heater material;forming an upper electrode material on the phase-change material; andetching the heater material, the phase-change material, and the upper electrode material to form a pillar including the lower electrode, the phase-change layer, and the upper electrode. |
地址 |
Gyeonggi-do KR |