Substrate processing method

摘要

A substrate processing method for a substrate having a photosensitive film on a top surface thereof, includes cleaning a back surface of the substrate after the formation of the photosensitive film and before exposure processing; transporting the substrate to a temperature adjuster such as a cooling unit, while holding the substrate with a first holder; adjusting a temperature of the substrate with the temperature adjuster; transporting the substrate from the temperature adjuster to the exposure device with a second holder; and transporting the substrate after the exposure processing to a first platform while holding the substrate with a third holder.

主权项

1. A substrate processing method for subjecting a substrate to processing using a substrate processing apparatus arranged adjacent to an exposure device,
the substrate processing method comprising the steps of: forming a photosensitive film made of a photosensitive material on a top surface of the substrate by a photosensitive film forming unit of the substrate processing apparatus; cleaning a back surface of the substrate by a back surface cleaning unit of the substrate processing apparatus after the formation of the photosensitive film and before exposure processing by the exposure device; transporting the substrate after the back surface cleaning by the back surface cleaning unit to a temperature adjuster of the substrate processing apparatus while holding the substrate after the back surface cleaning using a first holder of the substrate processing apparatus; adjusting a temperature of the substrate by the temperature adjuster; transporting the substrate before the exposure processing from the temperature adjuster to the exposure device while holding the substrate before the exposure processing using a second holder of the substrate processing apparatus; and transporting the substrate after the exposure processing from the exposure device to a first platform of the substrate processing apparatus while holding the substrate after the exposure processing using a third holder of the substrate processing apparatus.