Lithographic apparatus and device manufacturing method

摘要

A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.

主权项

1. A lithographic apparatus comprising:
an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; an actuator arranged to position an object; and a thermal expansion error compensator configured to compensate an error caused by thermal expansion of a part of the actuator coupled to the object by any heat dissipated by the actuator or another heat source, wherein the thermal expansion error compensator includes a temperature measurement system configured to measure a temperature of the part of the actuator and a calculator configured to calculate a deformation of the object resulting from the thermal expansion of the part based on the temperature measurement of the part of the actuator.