RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with decreased roughness can be formed.SOLUTION: The resist composition comprises: a polymeric compound (A1) having a structural unit (a0) derived from an acrylate in which a hydrogen atom bonded to a carbon atom at an α-position can be replaced by a substituent, the structural unit having a lactone-containing cyclic group including an electron withdrawing group at a side chain terminal; an acid generator component (B) that generates an acid by exposure; and a photo-disintegrating base (D1) that is decomposed by exposure to lose acid diffusion controllability.