发明名称 APPARATUS AND METHOD FOR PRODUCING PATTERNED RETARDATION FILM
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for producing a patterned retardation film, which can continuously produce a patterned retardation film giving a stable viewing angle and no discomfort to an image.SOLUTION: The apparatus for producing a patterned retardation film includes at least: a conveyance mechanism for continuously conveying a long film for forming an alignment layer, which includes a transparent substrate and a layer for forming an alignment layer containing a photo-aligning material and formed on the transparent substrate; a pattern irradiation mechanism for irradiating the layer for forming an alignment layer of the long film for forming an alignment layer, which is continuously conveyed, with polarized light through a mask to transfer a pattern; and a retardation layer formation mechanism for forming a patterned retardation layer on the patterned alignment layer formed by using the pattern irradiation mechanism. The pattern irradiation mechanism includes: a monitor mechanism for monitoring a distance between the surface of the layer for forming an alignment layer and the mask; and a regulation mechanism for regulating the distance between the surface of the layer for forming an alignment layer and the mask to within ±50 μm of an initial value, based on the distance monitored by the monitor mechanism.
申请公布号 JP2014191308(A) 申请公布日期 2014.10.06
申请号 JP20130069197 申请日期 2013.03.28
申请人 DAINIPPON PRINTING CO LTD 发明人 NAITO NOBUO
分类号 G02B5/30;G02F1/13363;G02F1/1337 主分类号 G02B5/30
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