Method for manufacturing nanostructure on micro-pattern using directional photofluidization, nanostructure manufactured by the same and application of the same

摘要

The present invention provides a method of manufacturing a nanostructure on a micro-pattern by using photofluidization, the method including: forming a three-dimensional micro-pattern made of a polymer having a directional photofluidization property on a transparent substrate; and irradiating the formed three-dimensional micro-pattern with light and photofluidizing the polymer to form a nanostructure, in which a region or a pattern of a nanostructure manufactured on the three-dimensional polymer pattern are controlled according to types of light, irradiation direction or irradiation angle irradiated thereon. According to the present invention, since a nanostructure can be selectively recorded / deleted on a surface of micro-pattern having a different height by using directional photofluidization phenomenon, multiple plasmonic properties can be integrated in one place to contribute to practical use of a regularly arranged plasmonic color filter / display.