| 摘要 |
<p>A substrate processing apparatus includes a processing unit processing a substrate; and an interface unit coming into contact with the processing unit and a stepper separate from the apparatus. The interface unit includes a first processing-unit-side transfer device; a second processing-unit-side transfer device; and a stepper-side transfer device. The first and second processing-unit-side transfer devices each receives a substrate from the processing unit and transfers the substrate to the stepper-side transfer device, and receives the substrate from the stepper-side transfer unit and transfers the substrate to the processing unit. The stepper-side transfer device receives the substrate from the first and second processing-unit-side transfer devices and transfers the substrate to the stepper, and receives the stepped substrate from the stepper and transfers the stepped substrate to the first and second processing-unit-side transfer devices.</p> |
