发明名称 METHOD OF PRODUCING FERROELECTRIC THIN FILM-FORMING COMPOSITION AND APPLICATION OF THE SAME
摘要 <p>A method for manufacturing a ferroelectric thin film-forming composition is a method for manufacturing a PZT thin film-forming composition which ages a PZT thin film-forming composition precursor at a temperature of 0 to 10 degrees centigrade for at least 30 days. Wherein, the PZT thin film-forming composition precursor is obtained by allowing a composition precursor material which contains the PZT precursor substance at a concentration of 23 to 38 mass% in terms of oxide in 100 mass% of the composition precursor materials to react to a high molecular compound.</p>
申请公布号 KR20140116792(A) 申请公布日期 2014.10.06
申请号 KR20140017979 申请日期 2014.02.17
申请人 MITSUBISHI MATERIALS CORP. 发明人 DOI TOSHIHIRO;SAKURAI HIDEAKI;SOYAMA NOBUYUKI
分类号 H01G4/10;H01G4/33 主分类号 H01G4/10
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