发明名称 |
METHOD OF PRODUCING FERROELECTRIC THIN FILM-FORMING COMPOSITION AND APPLICATION OF THE SAME |
摘要 |
<p>A method for manufacturing a ferroelectric thin film-forming composition is a method for manufacturing a PZT thin film-forming composition which ages a PZT thin film-forming composition precursor at a temperature of 0 to 10 degrees centigrade for at least 30 days. Wherein, the PZT thin film-forming composition precursor is obtained by allowing a composition precursor material which contains the PZT precursor substance at a concentration of 23 to 38 mass% in terms of oxide in 100 mass% of the composition precursor materials to react to a high molecular compound.</p> |
申请公布号 |
KR20140116792(A) |
申请公布日期 |
2014.10.06 |
申请号 |
KR20140017979 |
申请日期 |
2014.02.17 |
申请人 |
MITSUBISHI MATERIALS CORP. |
发明人 |
DOI TOSHIHIRO;SAKURAI HIDEAKI;SOYAMA NOBUYUKI |
分类号 |
H01G4/10;H01G4/33 |
主分类号 |
H01G4/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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