发明名称 COATING APPARATUS, AND COATING FILM FORMATION SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating film formation system capable of keeping a coating gap substantially within an allowable range and of obtaining a coating film with desired film thickness on a substrate at low cost with simple control.SOLUTION: In a coating apparatus 300, a gap (coating gap D) between a discharge port 310a and a substrate FS conveyed by a conveyance roller 23 in an X direction is regulated by a gap regulation part 37 disposed nearer to the conveyance roller 23 than a fixed table 330 in the X direction. Thereby, even if a frame fixing and supporting the fixed table 330, the conveyance roller 23 and the gap regulation part 37 is deformed by change of a peripheral temperature, the change amountΔD of the coating gap D is suppressed to be small compared with a case where the coating gap D is regulated by the table 330. As a result, the coating gap D within an allowable range can be obtained even when a member having high linear expansion coefficient is not utilized for the frame, or the temperature surrounding the coating apparatus 300 is not strictly controlled.</p>
申请公布号 JP2014188382(A) 申请公布日期 2014.10.06
申请号 JP20130063239 申请日期 2013.03.26
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KAJINO KAZUKI;HOSOKAWA AKIHIRO
分类号 B05C5/02;B05C9/14 主分类号 B05C5/02
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