发明名称 |
FLUORINE-CONTAINING SULFONIC ACID SALT, FLUORINE-CONTAINING SULFONIC ACID SALT RESIN, RESIST COMPOSITION, AND PATTERN FORMING METHOD USING SAME |
摘要 |
Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R01 represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER. |
申请公布号 |
KR20140116954(A) |
申请公布日期 |
2014.10.06 |
申请号 |
KR20147023610 |
申请日期 |
2013.01.17 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MORI KAZUNORI;NARIZUKA SATORU;HAGIWARA YUJI;AMEMIYA FUMIHIRO;FUJIWARA MASAKI |
分类号 |
C08F20/38;C08F20/22;C08F220/22;C08F220/38;G03F7/004;G03F7/038;G03F7/039;H01L21/027 |
主分类号 |
C08F20/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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