发明名称 PATTERN FORMING SYSTEM
摘要 A drawing system is provided to correct drawing positions properly when a substrate is deformed, cope with various production processes, and to form a drawing pattern with good accuracy. A drawing system includes: a light source; at least one optical modulator which modulates an illumination light from the light source according to drawing data having position coordinates based on a coordinate system prescribed to a substrate; a measuring unit which measures the positions of four indices with the substrate deformed, wherein the four indices are preset on the substrate to constitute fixed points of a reference rectangle(Z0); a correction unit which corrects the position coordinates of the drawing data in each reference division region, based on many reference division regions(DV0-DV3) and many deformed division regions(DM0-DM3), wherein the reference division regions are prescribed by dividing the reference rectangle, and the deformed division regions with rectangular shape are prescribed by dividing a deformed rectangle(Z) that uses the measured four indices as fixed points; and a drawing processor which controls the optical modulators so as to form a drawing pattern based on the corrected drawing data. The correction unit corrects the position coordinates of the drawing data so as to modify each deformed division region into the rectangular region based on the amount deviated from the corresponding reference division region.
申请公布号 KR101446485(B1) 申请公布日期 2014.10.06
申请号 KR20070058282 申请日期 2007.06.14
申请人 发明人
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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