DEPOSITION MASK, PREPARATORY BODY FOR DEPOSITION MASK, METHOD FOR MANUFACTURING DEPOSITION MASK, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

摘要

Provided are: a deposition mask which can have both high fineness and a light weight even when the size of the deposition mask is increased and which can have a highly fine deposition pattern formed thereon while keeping the strength thereof; a preparatory body for a deposition mask, which enables the above-mentioned deposition mask to be manufactured readily; a method for manufacturing a deposition mask; and a method for manufacturing an organic semiconductor element, which enables the production of a highly fine organic semiconductor element. A deposition mask comprising a metal mask (10) and a resin mask (20) laminated together, wherein the metal mask (10) has slits (15) formed therein and the resin mask (20) has openings (25) respectively corresponding to patterns to be formed by deposition at positions that overlap with the slits (15), and wherein the metal mask (10) has a general region (10a) in which the slits (15) are formed and thickened regions (10b) each of which has a larger thickness than the thickness of the general region.