THIN-FILM SURFACE PLANARIZATION METHOD AND ARRAY SUBSTRATE MANUFACTURING METHOD

摘要

The present invention relates to the field of displays. Disclosed are a thin-film surface planarization method and an array substrate manufacturing method, capable of solving the technical problem that the existing dry etching substantially impairs the surface smoothness of the other film layers under an etched film layer, thus improving the display performance of a liquid crystal display. The array substrate manufacturing method comprises: employing dry etching to etch a pattern on a nonmetal layer (4), and then planarizing the surface of a first film layer (3) to allow the first film layer (3) with a rough surface resulting from dry etching to regain surface smoothness, the first film layer (3) being located under the nonmetal layer (4).