DEVICE FOR THINNING RESIST LAYER

摘要

PROBLEM TO BE SOLVED: To provide a device for thinning a resist layer for forming a resist pattern that can solve problems about resolution and followability, the device capable of solving such a problem that a reduced amount of a resist layer is uneven within a substrate plane caused by a slow and uneven liquid flow.SOLUTION: The device for thinning a resist layer includes: a thinning unit which forms micelles of a photo-crosslinking resin component in a resist layer by a thinning liquid; and a micelle removing unit which removes micelles by a micelle removing liquid. The micelle removing unit includes micelle removing liquid supply sprays for supplying the micelle removing liquid; and the micelle removing liquid sprays are oriented in a single direction.