| 发明名称 |
METHOD FOR USING OPTICAL METROLOGY TO MONITOR CRITICAL DIMENSION UNIFORMITY |
| 摘要 |
Various embodiments provide systems, computer program products and computer implemented methods. In some embodiments, the system includes a method of determining a characteristic of an optical mask. The method including: generating a first set of electromagnetic field (EMF) simulation data about the optical mask, using a first set of simulation criteria; determining a first correlation between optical metrology data about the optical mask and the first set of EMF simulation data; and determining the characteristic of the optical mask based upon the first correlation between the optical metrology data and the first set of EMF simulation data. |
| 申请公布号 |
US2014297223(A1) |
申请公布日期 |
2014.10.02 |
| 申请号 |
US201313854596 |
申请日期 |
2013.04.01 |
| 申请人 |
International Business Machines Corporation |
发明人 |
Hibbs Michael S.;Stobert Ian P.;Tirapu-Azpiroz Jaione |
| 分类号 |
G01B11/24 |
主分类号 |
G01B11/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of determining a characteristic of an optical mask, the method comprising:
generating a first set of electromagnetic field (EMF) simulation data about the optical mask, using a first set of simulation criteria; determining a first correlation between optical metrology data about the optical mask and the first set of EMF simulation data; and determining the characteristic of the optical mask based upon the first correlation between the optical metrology data and the first set of EMF simulation data. |
| 地址 |
Armonk NY US |
