| 主权项 |
1. A composition suitable for use in forming a topcoat layer over a layer of photoresist, the composition comprising:
a first resin, a second resin and a third resin which are different from each other, wherein the first resin comprises one or more fluorinated groups and is present in the composition in a larger proportion by weight than the second and third resins individually, wherein the second resin has a lower surface energy than a surface energy of the first resin and the third resin, wherein the second resin is substantially immiscible with the first resin, and wherein the third resin comprises one or more strong acid groups. |
