ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME

摘要

An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.

主权项

1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a nitrogen-containing compound, and a resin (Ab) capable of varying a polarity thereof by the action of an acid, wherein the nitrogen-containing compound is a compound having at least one amino group formed by bonding one or two hydrogen atoms to a nitrogen atom, and at least one hydrogen atom of said one or two hydrogen atoms is substituted by an —S—R3 group or an —S(O)R3 group, wherein R3 represents a substituent.