| 摘要 |
<p>This lithographic device is provided with: an acquisition unit for acquiring coordinate data indicating first locations constituting the designed locations of a plurality of reference marks furnished on an exposed substrate, coordinate data indicating a lithographic pattern defined on the basis of the first locations, to be produced on the exposed substrate, and coordinate data indicating second locations which are the actual locations of the plurality of reference marks; a derivation unit for deriving a physical quantity indicating the magnitude of strain of the exposed substrate, doing so on the basis of the first locations and the second locations, and for deriving, for each of the plurality of reference marks, a correction level in relation to misalignment of the first locations and the second locations; a reducing unit for reducing, by a greater amount for a greater physical quantity, each of the correction levels derived by the derivation unit; and a correction unit for correcting the coordinate data indicating the lithographic pattern, doing so on the basis of the correction levels reduced by the reducing unit, when the lithographic pattern is produced on the exposed substrate on the basis of the second locations.</p> |
