| 发明名称 |
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM |
| 摘要 |
There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member. |
| 申请公布号 |
US2014291542(A1) |
申请公布日期 |
2014.10.02 |
| 申请号 |
US201414224149 |
申请日期 |
2014.03.25 |
| 申请人 |
Hitachi High-Tech Science Corporation |
发明人 |
YASAKA Anto;SUGIYAMA Yasuhiko;OBA Hiroshi |
| 分类号 |
H01J27/26;H01J37/08 |
主分类号 |
H01J27/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An emitter structure comprising:
a pair of conductive pins which are fixed to a base member; a filament which is connected between the pair of conductive pins; and an emitter which is connected to the filament and has a sharp tip; wherein a supporting member is fixed to the base material, and the emitter is connected to the supporting member. |
| 地址 |
Tokyo JP |
