PREPARATION METHOD FOR COA ARRAY SUBSTRATE, ARRAY SUBSTRATE, AND DISPLAY DEVICE

摘要

A preparation method for a COA array substrate, an array substrate, and a display device. The preparation method comprises the following steps: forming a protection layer (12) on a thin film transistor (TFT) substrate (11); coating a photoresist layer (21) on the protection layer (12), the photoresist layer (21) being also used as a planarization layer (14), and the TFT substrate (11) comprising a substrate (111) and a TFT (112); forming a color film accommodation hole (32) in the photoresist layer (21) by a photoetching process; and fabricating a color filter layer (31) in the color film accommodation hole (32). The preparation method can reduce the complexity and cost in the existing preparation method for the array substrate.