METHODS FOR CONTROLLING ACROSS WAFER DIRECTED SELF-ASSEMBLY

摘要

A method (100) for treating a layered substrate including a layer of a block copolymer is provided. The method (100) includes identifying a non-uniformity in the layer of the block copolymer (120); controlling a process variable correlated to the non-uniformity in the layer of the block copolymer (140); and annealing the layer of the block copolymer under a process condition affected by the process variable (160) to compensate for at least a portion of the non-uniformity in the layer of the block copolymer to form a pattern comprising a plurality of domains having improved uniformity therein. The method (100) further provides a way for reducing a non- uniformity in a layered substrate comprising a layer of a block copolymer on a pre- patterned substrate.