| 摘要 |
<p>An ion source (200) includes an ion source chamber (202) having a longitudinal axis (212), the ion source chamber operative to define a plasma therein. The ion source also includes a split solenoid assembly (203) comprising a first solenoid (204) and a second solenoid (204) that are mutually disposed along opposite sides of the ion source chamber, where each of the first solenoid and second solenoid comprises a metal member (208) having a long axis parallel to the longitudinal axis of the ion source chamber, and a main coil (205) having a coil axis parallel to the long axis and comprising a plurality of windings that circumscribe the metal member. The main coil defines a coil footprint that is larger than an ion source chamber footprint of the ion source chamber.</p> |
