发明名称 PHOTORESIST STRIPPER
摘要 <p>A photoresist stripper solution composition according to the present invention improves adhesion to a thin film layer laminated on the top by preventing an uneven surface by a color filter swelling phenomenon, prevents defects by making the thickness of a part filled with liquid crystal uniform, and obtaining high process efficiency by improving the removal of photoresist due to the activation of amine compounds by a small amount of water.</p>
申请公布号 KR101445668(B1) 申请公布日期 2014.10.02
申请号 KR20130102825 申请日期 2013.08.29
申请人 ENF TECHNOLOGY CO., LTD. 发明人 LEE, SANG DAI;PARK, YOUNG JIN;KANG, YOUNG HAN;YOU, JIN HO;LIM, CHAN KYU
分类号 G03F7/34;G03F7/42;H01L21/027 主分类号 G03F7/34
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