发明名称 |
PHOTORESIST STRIPPER |
摘要 |
<p>A photoresist stripper solution composition according to the present invention improves adhesion to a thin film layer laminated on the top by preventing an uneven surface by a color filter swelling phenomenon, prevents defects by making the thickness of a part filled with liquid crystal uniform, and obtaining high process efficiency by improving the removal of photoresist due to the activation of amine compounds by a small amount of water.</p> |
申请公布号 |
KR101445668(B1) |
申请公布日期 |
2014.10.02 |
申请号 |
KR20130102825 |
申请日期 |
2013.08.29 |
申请人 |
ENF TECHNOLOGY CO., LTD. |
发明人 |
LEE, SANG DAI;PARK, YOUNG JIN;KANG, YOUNG HAN;YOU, JIN HO;LIM, CHAN KYU |
分类号 |
G03F7/34;G03F7/42;H01L21/027 |
主分类号 |
G03F7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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