| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure system and an exposure method capable of forming patterns on a substrate with increased accuracy.SOLUTION: An exposure system comprises: a support base for supporting a substrate; a plurality of masks arranged on the upper side of the support base; and a light source capable of irradiating the substrate with light through the plurality of masks. The plurality of masks includes: a first mask patterned with a light-shielding film; and a second mask disposed on the upper side or the lower side of the first mask, and having no light-shielding films patterned in a second region which faces a first region where the light-shielding film does not exist in the first mask patterned with the light-shielding film. A plurality of laser irradiation marks are formed at least in the second region of the second mask.</p> |
