发明名称 |
STAINLESS STEEL FOR CUTLERY AND METHOD OF MANUFACTURING THE SAME |
摘要 |
The present invention has the ultimate purpose of obtaining cutlery having marked characteristics such as high hardness and high toughness, and provides an intermediate material, an annealed material, and a cold-rolled steel strip for stainless steel for cutlery, and a method for manufacturing them to achieve the purpose. Provided is an intermediate material for stainless steel for cutlery, the intermediate material being a material after hot rolling but before annealing, having a composition, in terms of % by mass, of from 0.46 to 0.72% C, from 0.15 to 0.55% Si, from 0.45 to 1.00% Mn, from 12.5 to 13.9% Cr, from 0 to 1.5% Mo, from 0 to 0.012% B, and the balance being Fe and impurities; and wherein a ratio of a diffraction peak area from an fcc phase (a sum total of diffraction peak areas from (200) plane, (220) plane, and (311) plane) to a diffraction peak area from a bcc phase (a sum total of diffraction peak areas from (200) plane and (211) plane) (the diffraction peak area from the fcc phase/the diffraction peak area from the bcc phase) is 30 or less in an X-ray diffraction of a vertical section. |
申请公布号 |
US2014294662(A1) |
申请公布日期 |
2014.10.02 |
申请号 |
US201214346740 |
申请日期 |
2012.09.14 |
申请人 |
Ueno Tomonori;Yoshiyama Goh;Kishigami Ichiro |
发明人 |
Ueno Tomonori;Yoshiyama Goh;Kishigami Ichiro |
分类号 |
C22C38/54;C22C38/50;C22C38/46;B21B3/02;C22C38/06;C22C38/04;C22C38/02;C22C38/00;C21D8/02;C22C38/44 |
主分类号 |
C22C38/54 |
代理机构 |
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代理人 |
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主权项 |
1. An intermediate material for stainless steel for cutlery, the intermediate material being a material after hot rolling but before annealing, having a composition, in terms of % by mass, of from 0.46 to 0.72% C, from 0.15 to 0.55% Si, from 0.45 to 1.00% Mn, from 12.5 to 13.9% Cr, from 0 to 1.5% Mo, from 0 to 0.012% B, and the balance being Fe and impurities; and wherein a ratio of a diffraction peak area from an fcc phase (a sum total of diffraction peak areas from (200) plane, (220) plane, and (311) plane) to a diffraction peak area from a bcc phase (a sum total of diffraction peak areas from (200) plane and (211) plane) (the diffraction peak area from the fcc phase/the diffraction peak area from the bee phase) is 30 or less in an X-ray diffraction of a vertical section. |
地址 |
Yasugi-shi JP |