APPARATUS FOR PROCESSING SUBSTRATE

摘要

An apparatus for processing a substrate according to one embodiment of the present invention comprises: a processing chamber having an inner space for accommodating a substrate transported from the outside, the inner space being the space in which the processing of the substrate takes place; and a tube-type heater installed along the side walls of the processing chamber so as to be arranged on the outer periphery of the inner space, and having a fluid channel through which a refrigerant supplied from the outside flows.