发明名称 TIN/PLATINUM COMPLEX OXIDE AND METHOD FOR MANUFACTURING SAME
摘要 <p> Reactive sputtering, etc., is performed to combine SnO2 and Pt simultaneously by sputtering under predetermined film-forming conditions to form a Pt-doped SnO2 film, and a rutile-structure tin/platinum complex oxide represented by the general formula SnXPt(1-X)O(2-δ) is produced (0.7<X<0.9; 0≤δ<2). The present invention makes it possible to obtain a novel tin/platinum complex oxide having stable catalytic performance due to Pt microparticles (Pt atoms) being densely dispersed in large quantities in SnO(2-δ) so that the Pt oxidation state is fixed. Said oxide can be used in a variety of catalysts, sensor materials, catalytic electrodes, etc.</p>
申请公布号 WO2014155594(A1) 申请公布日期 2014.10.02
申请号 WO2013JP59178 申请日期 2013.03.28
申请人 FUJI ELECTRIC CO., LTD. 发明人 SUZUKI TAKUYA;MURATA NAOYOSHI
分类号 C01G55/00 主分类号 C01G55/00
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