| 摘要 |
This nanoparticle differentiation device (1) is provided with: a plurality of chambers (9) arranged in series and partitioned from each other by means of partition walls (5); a generation chamber (2) in which a material (4) to be vaporized is disposed; a plurality of film-formation chambers (3a-3c) at which substrates (7) are disposed for film formation of nanoparticles (8a-8c) generated from the material (4); a plurality of interconnection tubes (6) provided penetrating the partition walls (5) in order to interconnect adjacent chambers (9) of the plurality of chambers (9) to each other; a gas introduction tube (10) for introducing cooling gas and interconnecting with the generation chamber (2); and vacuum tubing (14) that is for is for evacuating and that interconnects with a high-vacuum chamber (13) that is a film-formation chamber and the chamber (9) disposed at the furthest position from the generation chamber (2) among the plurality of chambers (9). |
