SUBSTRATE AGENT AND PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate agent which enables production of a substrate provided with a nano structure in which positions and orientation are designed more freely on the surface of the substrate by using phase separation of a block copolymer and allows easy distinguished use for purposes by selecting the type of a block copolymer used, and to provide a method of forming a pattern of a layer containing a block copolymer by using the substrate agent.SOLUTION: A substrate agent for phase separation of a layer containing a block copolymer composed of a plurality of kinds of blocks formed on a substrate includes a resin ingredient, and the resin ingredient contains 90 mol% or more structural units originated from aromatic ring-containing monomers and mol5% or less structural units derived from methacrylic acid or a methacrylate ester.