| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of preventing the used liquid of a surface treatment process device from adhering to a process chamber.SOLUTION: A device for liquid treatment of a substrate includes a substrate holder, and a liquid collector surrounding the substrate holder. The liquid collector includes a groove for collecting the liquid used for treating the substrate. The groove is communicating with a discharge tube, and the liquid collector further includes a concave surface spreading from a discharge opening in the groove to the inlet opening of the discharge tube positioned lower than the groove. The discharge opening in the groove has a cross-sectional area at least two times that of the inlet opening of the discharge tube.</p> |
