发明名称 |
SUBSTRATE AGENT AND PATTERN FORMATION METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate agent and a method of forming a pattern of a layer containing a block copolymer by using the substrate agent.SOLUTION: A substrate agent for phase separation of a layer containing a block copolymer 3 consisting of a plurality of kinds of blocks formed on a substrate 1 and bonded together contains a resin ingredient, and the resin ingredient comprises structural units having an aromatic group, structural units having a hydroxyalkyl group and structural units having no aromatic groups or hydroxyalkyl groups.</p> |
申请公布号 |
JP2014185318(A) |
申请公布日期 |
2014.10.02 |
申请号 |
JP20130260594 |
申请日期 |
2013.12.17 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
KUROSAWA TSUYOSHI;SHIONO HIROHISA;MIYAGI MASARU;MATSUMIYA YU;MIYASHITA KENICHIRO;OMORI KATSUMI |
分类号 |
C09D201/00;B05D1/36;B05D5/04;B05D7/24;B82Y30/00;B82Y40/00;C09D5/00 |
主分类号 |
C09D201/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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