发明名称 SUBSTRATE AGENT AND PATTERN FORMATION METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate agent and a method of forming a pattern of a layer containing a block copolymer by using the substrate agent.SOLUTION: A substrate agent for phase separation of a layer containing a block copolymer 3 consisting of a plurality of kinds of blocks formed on a substrate 1 and bonded together contains a resin ingredient, and the resin ingredient comprises structural units having an aromatic group, structural units having a hydroxyalkyl group and structural units having no aromatic groups or hydroxyalkyl groups.</p>
申请公布号 JP2014185318(A) 申请公布日期 2014.10.02
申请号 JP20130260594 申请日期 2013.12.17
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KUROSAWA TSUYOSHI;SHIONO HIROHISA;MIYAGI MASARU;MATSUMIYA YU;MIYASHITA KENICHIRO;OMORI KATSUMI
分类号 C09D201/00;B05D1/36;B05D5/04;B05D7/24;B82Y30/00;B82Y40/00;C09D5/00 主分类号 C09D201/00
代理机构 代理人
主权项
地址