发明名称 APPARATUS FOR TREATING DEVELOPMENT WASTE LIQUID OF PHOTOSENSITIVE RESIN PLATE
摘要 <p>PROBLEM TO BE SOLVED: To efficiently separate a photosensitive resin component from a development waste liquid of a photosensitive resin plate without decreasing a treatment capacity.SOLUTION: An apparatus for treating a development waste liquid of a photosensitive resin plate includes a container for reserving a development waste liquid and a heater for heating the development waste liquid in the container; and the apparatus further includes a washing device for washing a part of the heater where heat is transmitted to the development waste liquid.</p>
申请公布号 JP2014186110(A) 申请公布日期 2014.10.02
申请号 JP20130059846 申请日期 2013.03.22
申请人 TORAY IND INC 发明人 HAYASHIBARA JUNKI
分类号 G03F7/30;C02F1/04 主分类号 G03F7/30
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