| 摘要 |
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin. |
| 主权项 |
1. An optically patternable sacrificial film-forming composition for use in surface micro-machining process, comprising
(A-1) (i) a cresol novolac resin containing at least 40 mol % of p-cresol and having a weight average molecular weight of 2,000 to 30,000 and a melting temperature of at least 130° C. in which some or all phenolic hydroxyl groups are esterified with 1,2-naphthoquinonediazidosulfonyl halide, or (ii) a mixture of the cresol novolac resin having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonyl halide and a cresol novolac resin containing at least 40 mol % of p-cresol and having a weight average molecular weight of 2,000 to 30,000 and a melting temperature of at least 130° C. in which phenolic hydroxyl groups are not esterified, (A-2) the novolac resin (i) or the novolac resin mixture (ii) of (A-1) and a 1,2-naphthoquinonediazidosulfonic acid ester, or (A-3) a cresol novolac resin containing at least 40 mol % of p-cresol and having a weight average molecular weight of 2,000 to 30,000 and a melting temperature of at least 130° C. in which phenolic hydroxyl groups are not esterified and a 1,2-naphthoquinonediazidosulfonic acid ester, and a crosslinker capable of forming crosslinks within the cresol novolac resin in the presence of an acid catalyst. |
