发明名称 INSPECTION METHOD AND INSPECTION APPARATUS
摘要 An inspection method and apparatus comprising, acquiring a plurality of optical images of a sample in which a plurality of dies having repetitive pattern are provided, comparing the optical images to each other by a die-to-die method and detecting a defect, obtaining at least one of a dimension difference and a dimension ratio between the repetitive pattern of the optical image to be inspected and the repetitive pattern of the optical image to be reference in the die-to-die method, extracting a die of the optical image having the dimension difference or dimension ratio closest to that at a defect position of a die of the optical image in which the defect is detected, compared, and stored, and determining that the defect does not exist in the optical image when the defect is not detected from the optical image in which the defect is originally detected.
申请公布号 US2014294283(A1) 申请公布日期 2014.10.02
申请号 US201414228448 申请日期 2014.03.28
申请人 NuFlare Technology, Inc. 发明人 TAKEDA Masaya;Isomura Ikunao
分类号 G06T7/00 主分类号 G06T7/00
代理机构 代理人
主权项 1. An inspection method comprising: acquiring a plurality of optical images of a sample in which a plurality of dies having repetitive pattern are provided; comparing the optical images to each other by a die-to-die method and detecting an optical image having a defect; obtaining at least one of a dimension difference and a dimension ratio between the repetitive pattern of the optical image to be inspected and the repetitive pattern of the optical image to be reference in the die-to-die method; extracting a die of the optical image having the dimension difference or dimension ratio closest to that at a defect position of a die of the optical image in which the defect is detected; and comparing the optical image in which the defect is detected and the optical image of the die having the dimension difference or dimension ratio closest to that at the defect position of the die of the optical image by the die-to-die method, storing information on the defect when the defect is detected again from the optical image in which the defect is originally detected, and determining that the defect does not exist in the optical image when the defect is not detected from the optical image in which the defect is originally detected.
地址 Yokohama JP