发明名称 THIN-FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE INCLUDING THE SAME
摘要 A thin-film transistor, a method for manufacturing the same and a display device including the same are provided. The thin-film transistor may include a substrate, and an active layer formed on the substrate. The active layer may be made from an oxide semiconductor. A gate electrode may be formed above the active layer or below the active layer. A conductive layer may come in contact with the active layer, may be overlapped with at least a part of the gate electrode, and may be insulated from the gate electrode. A source electrode and a drain electrode may be electrically connected to the active layer. The conductive layer can reduce a channel length of the thin-film transistor and increase a capacitance between the source electrode and the gate electrode or between the drain electrode and the gate electrode.
申请公布号 US2014291635(A1) 申请公布日期 2014.10.02
申请号 US201314095278 申请日期 2013.12.03
申请人 LG Display Co., Ltd. 发明人 CHO HyungNyuck
分类号 H01L29/786;H01L29/66;H01L27/32 主分类号 H01L29/786
代理机构 代理人
主权项 1. An thin-film transistor comprising: a gate electrode disposed on an insulating layer, an active layer disposed on a substrate below the insulating layer, the active layer comprising a first region that laterally overlaps with the gate electrode, a first portion of the first region comprising a channel of the transistor; a source electrode and a drain electrode each electrically connected to the active layer; and one or more conductive layers, each conductive layer electrically connected to either the source or drain electrode, each conductive layer laterally overlapping and directly physically contacting a second portion of the first region of the active layer to reduce a length of the channel.
地址 Seoul KR
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