| 摘要 |
The present invention provides a method for adjusting a vapor-phase growth apparatus in which the individual difference between a heater-set temperature and a substrate-mounted plate temperature is eliminated in the vapor-phase growth apparatus. The method for adjusting a vapor-phase growth apparatus pertaining to the present invention is characterized in being provided with a thermocouple-location-adjusting step, in which the relative location of a thermocouple (17) and a heater (15) is adjusted so that the amount of change in the heating temperature of a substrate-mounted plate (7) with respect to the amount of change in the heater-set temperature reaches a predetermined value, and a temperature-control-value-correcting step, in which the thermocouple (17) is disposed at the location adjusted in the thermocouple-location-adjusting step so as to obtain the temperature of the substrate-mounted plate (7) when the substrate-mounted plate (7) is heated by the heater (15) in accordance with a prescribed set temperature, and a temperature-control value with respect to a temperature-set value is corrected on the basis of the difference in temperature between the temperature-set value at this time and the substrate-mounted plate (7). |
