| 摘要 |
PROBLEM TO BE SOLVED: To appropriately form a predetermined pattern on a substrate in a substrate processing using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer.SOLUTION: A block copolymer 404 is applied over the upper surface of a first neutral layer 400 on a wafer W, and a neutral agent is applied over the upper surface of the block copolymer 404, thereby forming a second neutral layer 405. By subjecting the wafer W, which has been provided with the second neutral layer 405 on the block copolymer 404, to a heat treatment, the block copolymer 404 is phase separated into a hydrophilic polymer 406 and a hydrophobic polymer 407. The neutral agent does not dissolve the block copolymer 404, and prevents oxygen from reaching the block copolymer 404 during the heat treatment. |
