发明名称 COPPER-AND-TITANIUM-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR
摘要 The Cu- and Ti-containing composition of the present invention contains titanium oxide including rutile-crystal-type titanium oxide, and a divalent copper compound, wherein the rutile-crystal-type titanium oxide exhibits the most intense diffraction peak attributed to rutile-type titanium oxide having a full width at half maximum of 0.65° or less, in a Cu—Kα line X-ray diffraction pattern, which is obtained by plotting intensity of diffraction line with respect to diffraction angle 2θ. The composition exhibits excellent anti-viral property under light and in the dark, and excellent organic compound degradability under light.
申请公布号 US2014294989(A1) 申请公布日期 2014.10.02
申请号 US201214002276 申请日期 2012.12.17
申请人 SHOWA DENKO K.K. 发明人 Miyaishi So;Kuroka Yasushi;Hosogi Yasuhiro;Li Ding
分类号 A01N59/20;B01J27/135;A61L9/01;B01J27/055;B01J27/25;A01N55/02;B01J23/72;B01J31/38 主分类号 A01N59/20
代理机构 代理人
主权项 1. A Cu- and Ti-containing composition comprising titanium oxide including rutile-crystal-type titanium oxide, and a divalent copper compound, wherein the rutile-crystal-type titanium oxide exhibits the most intense diffraction peak attributed to rutile-type titanium oxide having a full width at half maximum of 0.65° or less, in a Cu—Kα line X-ray diffraction pattern, which is obtained by plotting intensity of diffraction line with respect to diffraction angle 2θ, wherein the rutile-crystal-type titanium oxide content of titanium oxide is 50 mol % or more and the anatase-type titanium oxide content of titanium oxide is less than 50 mol %.
地址 Minato-ku, Tokyo JP