发明名称 METHOD FOR MANUFACTURING POWER SEMICONDUCTOR DEVICE AND POWER SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a power semiconductor device capable of improving product reliability by suppressing thermal expansion and thermal contraction by a cold heat cycle, and a power semiconductor device manufactured by the method.SOLUTION: A method for manufacturing a power semiconductor device comprising a base substrate having a conductor layer on a surface thereof and a semiconductor element mounted on the base substrate according to an embodiment includes a step of forming a curing layer on a surface of the conductor layer.
申请公布号 JP2014187088(A) 申请公布日期 2014.10.02
申请号 JP20130059349 申请日期 2013.03.22
申请人 TOSHIBA CORP 发明人 KURI YUUJI;SEKIYA HIRONORI;SASAKI HARUKA;KOTANI KAZUYA;TADA NOBUMITSU;MATSUMURA HITOTSUGU;IGUCHI TOMOHIRO
分类号 H01L21/304;B24C1/10;H01L25/07;H01L25/18 主分类号 H01L21/304
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