发明名称 |
METHOD FOR MANUFACTURING POWER SEMICONDUCTOR DEVICE AND POWER SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a power semiconductor device capable of improving product reliability by suppressing thermal expansion and thermal contraction by a cold heat cycle, and a power semiconductor device manufactured by the method.SOLUTION: A method for manufacturing a power semiconductor device comprising a base substrate having a conductor layer on a surface thereof and a semiconductor element mounted on the base substrate according to an embodiment includes a step of forming a curing layer on a surface of the conductor layer. |
申请公布号 |
JP2014187088(A) |
申请公布日期 |
2014.10.02 |
申请号 |
JP20130059349 |
申请日期 |
2013.03.22 |
申请人 |
TOSHIBA CORP |
发明人 |
KURI YUUJI;SEKIYA HIRONORI;SASAKI HARUKA;KOTANI KAZUYA;TADA NOBUMITSU;MATSUMURA HITOTSUGU;IGUCHI TOMOHIRO |
分类号 |
H01L21/304;B24C1/10;H01L25/07;H01L25/18 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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